Publications HAL de Antoun du labo/EPI GREMI

2019

auteur
G. Antoun, R. Dussart, T. Tillocher, P. Lefaucheux, C. Cardinaud, A. Girard, S. Tahara, K. Yamazaki, K. Yatsuda, J. Faguet, K. Maekawa
titre
The role of physisorption in the cryogenic etching process of silicon
article
Japanese Journal of Applied Physics, Japan Society of Applied Physics, 2019, 58 (SE), pp.SEEB03. ⟨10.7567/1347-4065/ab1639⟩
DOI
DOI : 10.7567/1347-4065/ab1639
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BibTex