Publications HAL de Antoun du labo/EPI GREMI

2019

auteur
G. Antoun, P. Lefaucheux, T. Tillocher, Rémi Dussart, Kumiko Yamazaki, Koichi Yatsuda, Jacques Faguet, Kaoru Maekawa
titre
Cryo atomic layer etching of SiO 2 by C F8 physisorption followed by Ar plasma
article
Applied Physics Letters, American Institute of Physics, 2019, 115 (15), pp.153109. ⟨10.1063/1.5119033⟩
DOI
DOI : 10.1063/1.5119033
Accès au bibtex
BibTex
auteur
G. Antoun, R. Dussart, T. Tillocher, P. Lefaucheux, C. Cardinaud, A. Girard, S. Tahara, K. Yamazaki, K. Yatsuda, J. Faguet, K. Maekawa
titre
The role of physisorption in the cryogenic etching process of silicon
article
Japanese Journal of Applied Physics, Japan Society of Applied Physics, 2019, 58 (SE), pp.SEEB03. ⟨10.7567/1347-4065/ab1639⟩
DOI
DOI : 10.7567/1347-4065/ab1639
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BibTex