Publications HAL de Nozieres; Prebeanu; Garello; Dieny; Sousa de la structure 1043270;1402;40366

2017

Conference papers

titre
Novel approach for nano-patterning magnetic tunnel junctions stacks at narrow pitch: A route towards high density STT-MRAM applications
auteur
V. D. Nguyen, P. Sabon, J. Chatterjee, L. Tillie, P. Veloso Coelho, S. Auffret, R. Sousa, L. Prejbeanu, E. Gautier, L. Vila, B. Dieny
article
2017 IEEE International Electron Devices Meeting (IEDM), Dec 2017, San Francisco, CA, United States. ⟨10.1109/IEDM.2017.8268517⟩
Accès au texte intégral et bibtex
https://hal.science/hal-01763666/file/IEDM%202017_submission%20vf_novel%20MTJ%20nanopatterning%20approach.pdf BibTex